Christopher Mims / Wall Street Journal:
A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography — We are now one generation of technological alchemy away from the smallest possible silicon microchips
Christopher Mims / Wall Street Journal:
A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography — We are now one generation of technological alchemy away from the smallest possible silicon microchips
Source: TechMeme
Source Link: http://www.techmeme.com/260302/p4#a260302p4